High-density high-purity sputtering target:
The sputtering target (purity: 99.9% -99.999%)
1.metal target:
Nickel target, Ni, Ti target, Ti, Zn target, Zn, Cr target, Cr, Mg target, Mg, Nb target, Nb, Sn target, Sn, Al target, Al, indium target, In, Fe target, Fe, aluminum zirconium target, ZrAl, titanium aluminum target, TiAl, zirconium target, Zr, Al-Si target, AlSi, silicon target, Si, Cu target Cu, tantalum target T, a, a target germanium, Ge, silver target, Ag, cobalt target , Co, gold target, Au, Gd target, Gd, the target lanthanum, La, yttrium target, Y, Ce target, Ce, tungsten target, w, stainless steel target, the target nickel-chromium, NiCr, hafnium target, Hf, mammography, Mo, iron-nickel target, FeNi, tungsten target, W, etc..
2.ceramic target
ITO target, target magnesium oxide, iron oxide target, a target of silicon nitride, silicon carbide target, a target of titanium nitride, chromium oxide target, a target of zinc oxide, zinc sulfide target, target of silica, silicon oxide target, cerium oxide target dioxide, zirconium target, target of niobium pentoxide, titanium dioxide target, target of zirconium dioxide, hafnium oxide target, a target of titanium diboride, zirconium diboride target, target of tungsten trioxide, aluminum oxide target pentoxide tantalum, niobium pentoxide target, target of magnesium fluoride, yttrium fluoride target, zinc selenide target, a target of aluminum nitride, silicon nitride target, a target of boron nitride, titanium nitride target, a target of silicon carbide, niobium acid lithium target, target praseodymium titanate, barium titanate target, target lanthanum titanate, nickel oxide target, sputtering targets.
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